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he ARTOF 10k is a new ultra high resolution electron energy analyzer for fast 2D band mapping. The instrument design combines the flight tube of a time of flight spectrometer with VG Scienta electron optics and becomes a spectrometer for Angular Resolved Time Of Flight (ARTOF) measurements. It requires a pulsed photon source with a maximum repetition rate of 1.5 MHz. The ARTOF 10k simultaneously improves energy resolution, angular resolution as well as transmission.
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MICROLAB 350 - Auger Electron Spectrometer
MICROLAB 350 is a high-performance, scanning Auger Electron Spectrometer (AES) with High Sensitivity and High Energy Resolution. SEM resolution <7 nm and Scanning Auger Mapping (SAM) resolution <12 nm.
Product Detail
High-performance scanning Auger electron spectrometer (AES)
Secondary Electron Mapping (SEM) at <7 nm Resolution
Scanning Auger Mapping (SAM) at <12 nm Resolution
High Sensitivity
Spherical Sector Analyser Allows High Energy Resolution for:
Chemical state determination
Reflected Electron Energy Loss Spectroscopy (REELS)
Measurement of dopants in silicon
Multitechnique Capability Including:
X-ray photoelectron spectroscopy (XPS)
Energy dispersive X-ray spectroscopy (EDX)
Backscattered electron detection
FIB
Preparation Facilities Including:
Fracture Stage
Heating/Cooling Stage
Evaporation Stage
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AES WITH GAIN POWER OF MICROCHANNEL PLATES
Models BDL800IR-MCP and BDL600IR-MCP
Features:
High Image Sensitivity at the Primary Beam Current - 50pA
Single/Dual 75 mm Microchannel Plates
Miniature Electron Gun with Double Focusing
AES at Beam Current 50 µA - 10µA
Integral Motion & Shutter
Suitable for ESDIAD
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PHI 700 Auger Nanoprobe
Overview
The PHI 700 Scanning Auger Nanoprobe provides high performance Auger (AES) spectral analysis, Auger imaging, and sputter depth profiling of complex materials including: nanomaterials, catalysts, metals, and electronic devices.
The 700’s field emission electron source provides a high brightness electron beam with a diameter of less than 6 nm for secondary electron imaging. The coaxial geometry of the 700’s electron column and Cylindrical Mirror Analyzer (CMA) enables high Auger sensitivity over a broad range collection angles ensuring rapid and complete analysis routine flat samples as well as samples with complex shapes or high surface roughness.
A high performance sputter ion gun, motorized five axis sample stage, and high sensitivity analyzer provide a uniquely high performance thin film analysis (sputter depth profiling) capability. User selectable thin film analysis features including: multi-point thin film analysis, low voltage (100-500 V) sputtering, Compucentric Zalar Rotation™ and an array of advanced data reduction tools in PHI MultiPak, allow a user to extract as much information as possible from a sputter depth profile data set.
For 40 years, PHI CMA based Auger instruments have been the first choice of surface analysts around the world. The PHI 700 provides a superior Auger instrument platform, proven reliability, and the performance.
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The JAMP-9500F offers the highest spatial resolution available in a microprobe: (min. probe diameter of 3nm for SEI ; 8nm for Auger analysis). Employing a low-aberration condenser lens (in which an electrostatic field and a magnetic field are superposed), combined with a patented "in-lens" Schottky field emission gun, the JAMP-9500F obtains very small spot sizes with beam currents up to 200nA.
The electron spectrometer is an electrostatic hemispherical analyzer (HSA) with a multi-channel detector, and was optimally designed for Auger analysis. It provides extreme energy resolution without sacrificing sensitivity.
With the JAMP-9500F, high resolution SEM imaging is possible as well as Auger image analysis and line profile analysis. Also, depth profile analysis can be performed during ion etching.
The JAMP-9500F features a high performance ion gun for high speed sputtering and low energy charge neutralization. User-friendly and easily operated, the JAMP-9500F also offers the flexibility of optional analysis functions such as EDS, SIMS and XPS.
Features
- 3nm SEI resolution
- 8nm probe diameter for Auger analysis
- Variable energy resolution from 0.05% to 0.6%
- Chemical state analysis in several 10nm areas
- Neutralizing gun allows Auger analysis of insulating materials
- Large specimen stage - samples up to 95mm in diameter
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- Dedicated lens design for combination with UHV Gemini Column
- Energy resolution 0.01% to 2%
- MCD 7 channel detector
Hemispherical electron spectrometer for Auger Electron Spectroscopy (AES), and Scanning Auger Microscopy (SAM) applications. The instrument is designed for use together with the UHV Gemini high resolution electron Column on a dedicated UHV system.
Special care has been taken to optimise the shape of the lens so that a wide acceptance angle can be collected with a working distance of approx. 22 mm, adapted to the geometrical shape of the UHV GEMINI Column's objective lens . As a main advantage over conventional lens systems a unique electron deflection setup is provided by means of double octopole deflectors for compensation ofthe errors introduced by magnetic and electrostatic fields from the Gemini objective lens
The electronics and software of the analyser and the UHV Gemini electron Column are interfaced on various levels to allow for a simultaneous control of analyser and electron beam during the measurement process. Not only fast low level trigger signals enhance the capability for precise aquisition with short dwelltimes, also the user interface offers unique capabilities for the combination of an SEM Column with an AES analyser.
The analyser features an extremely fast seven-channel pulse counting detection with >70 Mcps integral count rate, and a variable slit mechanism for optimisation of the resolution. An extremely broad range of pass energies offer the flexibility to set the appropriate compromise between intensity and resolution for almost any measurement task.
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Features:
Miniature Lens Design
Variable Beam Diameter
Variable Beam Energy
Low Outgassing Rate
Flexible Mounting Configuration
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First launched in 1994, the SX 100 is the latest generation CAMECA EPMA instrument. The central concept is a fully digitized instrument with highly integrated electronics and full automation for unattended analysis and evaluation. Comfort and ease of control are made possible by the dedicated keyboard together with the ergonomic software interface.
The tradition of superb analytical performances, based on the famous precision and reliability of the CAMECA WDS analyzers and extreme stability of the primary beam, has been continued. An uninterrupted development program has led to the introduction of new features.
Major applications are found in: geochemistry, mineralogy, geochronology, physical metallurgy, nuclear metallurgy, materials science including glass, ceramics, superconductors, cements, microelectronics, biochemistry, ...
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General description :
With features as a 0.1 mm entrance slit and 1 eV pass energy the R4000WAL-0.1 spectrometer claims the best energy resolution on the market. This wide angle acceptance analyzer is fully equipped for XPS, UPS, and ARPES studies with lens tables for overview and high resolution angular and transmission modes. Kinetic energies from 0.5 eV - 1500 eV are measured with a selection of slits and wide range of pass energies from 1-200.
Specifications:
- Energy resolution: < 1.8 meV FWHM at 2 eV pass energy and 20 eV kinetic energy
- Pass energies: 1, 2, 5, 10, 20, 25, 50, 100 and 200 eV
- Transmission mode lens acceptance: +/- 19 degrees
- Angular modes: ± 3.5°, ± 7°, ± 15°,
- Angular resolution < 0.1 degree from <0.1 mm sample
- Kinetic energy range: 0.5 eV - 1500 eV
- Working distance: 34 mm
- 40 mm diameter MCP detector system
- Bakeable to 150 degrees C
Included:
- Scienta R4000 ARPES mechanics and electronics
- Computer system
- Windows based acquisition software: SES (analyzer control software)
- Extremely stable and low noise electronics
- Strictly non-magnetic materials used in the interior
- Fix mode
- Swept mode
- Angular mode
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The CMA 100 combines a compact design and high performance. It mounts to a standard NW 100 CF (6" OD) flange, and features a unique integral retraction mechanism for easy access to the sample. Analogue as well as pulse counting mode detection is possible, providing optimum signals even with delicate samples.
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Miniature Back-Display LEED-AES Spectrometer Featuring Easy Fitting To Complex UHV Syst
Large Angle (90°) Fluorescent LEED Display
Mounting Flange: 4.5" O.D. (Cf63)
Auger Electron Spectroscopy as a Secondary Technique
Suitable For " In Situ" Film Growth Monitoring
Integral Shutter
External Linear Retraction
Convenient LEED Image Capture with External CCD Camera
Simple And Powerful Operation with Digital Controller
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Theta Probe - High Performance ARXPS Spectrometer
Thermo's Theta Probe combines advanced monochromator and lens and detector technology to provide rapid, precise analysis. With the revolutionary ARXPS capability to provide angular data simultaneously without tilting the sample
Product Detail
High-performance XPS, Small Area XPS (SAXPS) and Unique Angle Resolved XPS (ARXPS) capabilitySmall Area XPS with the Microfocus Monochromator for maximum sensitivity Sample Alignment is fast and accurate using the advanced optical system Elemental and chemical state mapping of surface features 70mm x 70mm sample stage for high throughput and sample thicknesses up to 25mm Automation for unattended operation Avantage Windows NT based data system
The Theta Probe instrument combine advanced monochromator, lens and detector technology with the Avantage data system (Windows NT) to provide rapid, precise analysis.
Developed from the highly successful Sigma Probe, Theta Probe's revolutionary ARXPS capability provides angular data simultaneously collected without tilting the sample.
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Overview
The Quantera, PHI's second generation Scanning X-ray Microprobe provides the sensitivity and tools needed to apply XPS surface analysis to a broader range of current and future product development and failure analysis needs. High performance micro-area spectroscopy, XPS depth profiling, automated insulator analysis, and robotic sample handling define a new generation of XPS surface analysis equipment for today's laboratory.
Important features of the Quantera SXM include:
- Patented scanning x-ray microprobe design with <9um diameter minimum x-ray beam size
- Complete XPS capabilities (spectroscopy, depth profiling, mapping, etc.) at all x-ray beam sizes
- Highest performance XPS instrument for thin film depth profiling
- Optional C60 sputter ion gun for organic / polymer depth profiling
- Automated effortless analysis of electrically insulating samples
- Accurate quantitative analysis
- Robotic sample handling
- A completely automated, easy to use instrument platform
Micro area spectroscopy and high performance thin film analysis capabilities open new areas of application for XPS surface analysis in all environments. The complete automation of the system makes it easy to use and increases the reproducibility of routine measurements. Large sample platens make it possible to analyze “real world” large samples or multiple small samples automatically. A new generation of XPS surface analysis instruments are available today from PHI.
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The JPS-9200 is a newly developed X-ray Photoelectron Spectrometer system used for micro-area surface analysis of a broad range of samples. The new hemispherical electron analyzer incorporates a combination of an electrostatic accelerating lens and magnetic field lens to improve sensitivity 20 times that of previous models. Both monochromatic and non-monochromatic x-ray sources are provided as standard. The minimum x-ray spot size is 30 microns. The ability to map very large areas (50mm x 18mm) is achieved with stage mapping. Using the Total Reflected XPS (TRXPS) mode backgrounds are significantly reduced thus improving the minimum detectability limit. The sample stage provides full automation for smooth and precise positioning.
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The NanoESCA offers up to 10 times better XPS image resolution, faster acquisition times, small spot spectroscopy with excellent energy resolution, and overview images with 100 times better resolution than presently commercially available instrumentation. For its revolutionary design the NanoESCA received the 2007 R&D 100 award (www.rdmag.com).
Significant technical development often requires thinking out of the box. Lateral resolution of conventional technologies for imaging XPS, be it scanning an x-ray beam or using magnetic lenses, has been stuck for many years at sub 10 µm. It was all too apparent that tweaking these technologies would not be sufficient to reach the resolution required for nanotechnology. This barrier is breached by the new, patent-protected (EP 1559126 US 7,250,599) NanoESCA. The design includes a non-magnetic, electrostatic PEEM lens and a double-pass hemispherical analyser. Rapid PEEM survey imaging (< 50 nm resolution) can be used to locate features, whilst its lateral resolution in imaging ESCA of 650 nm in the laboratory and 150 nm at the Synchrotron are simply unique.
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Electron spectrometers: AES, XPS, EELS...
