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| The LEAP Si™ Metrology System is a high-performance atom probe microscope manufacturer providing 3D, atomic resolution, compositional imaging and analysis to research and industry. Materials are examined by removing and analyzing individual atoms. Atoms are removed by a combination of a high electrical field and either: (1) an ultra-fast voltage pulse or (2) an ultra-fast professional laser pulse. The LEAP Si employs patented innovations that unlock the power of the 3D atom probe to address previously unsolved measurement challenges in semiconductors, material science, and nanomagnetics. Key features include: largest field of view, highest data rate, excellent mass resolution, and simplified sample preparation using microtip arrays. With the LEAP Si measurements that would have taken months, or been completely impossible, can be accomplished in a matter of hours. |
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Nanosurf's easyScan series has gained worldwide popularity through its affordability, portability, and ease of use, with hundreds of systems currently in use.
Now its successor, the easyScan 2, unites these three unique characteristics with a fully modular system design. Whether you need a teaching tool, a training Scanning Probe Industrial microscope, or a research instrument, what you need is what you get. |
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| The Atomic force microscope (AFM), has been the instrument of choice for three dimensional measurements at the nanometer scale. With the MFP-3D Stand Alone (MFP-3D-SA) AFM, scientists can now choose a sensitive and precise AFM with the lowest noise performance that also includes a complete scientific software environment. The MFP-3D-SA is ideal for many applications including physics, material science, polymers, chemistry, nanolithography, bioscience, and quantitative nanoscale measurements. The MFP-3D has the flexibility to acquire your data, analyze it, and even make publication-ready graphics. |
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Dimension Vx210/310 AFP
The Dimension Vx 210/310 Atomic Force Profiler (AFP) can deliver the unique combination of AFM resolution, long scan capability (up to 100mm) with the high vertical and lateral resolution measurements required for sub-0.25 micron features. The Dimension Vx 210/310 systems are ideal for CMP metrology applications that require both long scans for measuring planarity across an entire die as well as true AFM resolution imaging for examining tungsten plug recess, vias and metal lines. The AFP enables comparison of pre-and post-CMP effects such as dishing, erosion, plugs, vias, step heights and planarity.
Dimension Vx200/300 AFP
The Dimension Vx200/300 Atomic Force Profiler (AFP) combines the resolution of an atomic force microscopy (AFM) with the long scan capability of a profiler to offer the highest performance profiling and atomic force microscopy available. It offers non-destructive profiling for CMP control and characterization and high aspect ratio depth measurements in a single platform for 200mm and 300mm substrates. This semi-automated platform can be configured to handle a variety of samples including wafers, data storage sliders, and square substrates.
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Dimension X3D Photomask
The Dimension X3D-PM Afm is the newest line of automated AFM metrology specifically designed for Photomask applications. The system provides superior repeatability, high resolution and comprehensive profile and CD metrics on a variety of materials including chrome, quartz, MoSi and photoresist. The unique 3D-AFM technology is a high resolution non-destructive technique that is insensitive to material properties. The X3D-PM Atomic Force Microscope manufacturers has fully automated professional mask handling for 150mm reticles using a SMIF loadport.
The Dimension X3D-PM Atomic Force Microscope provides the flexibility to gather detailed information in one tool for CD elements encountered in the most demanding mask manufacturing processes including:
Multiple CD of lines and spaces
Line and space depth metrology
Holes CD and depth
Sidewall angle on vertical and re-entrant profiles
Line width variability
Defect review for mask repair feedback |
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Dimension Vx200/300 AFP
The Dimension Vx200/300 Atomic Force Profiler (AFP) combines the resolution of an atomic force microscopy (AFM) with the long scan capability of a profiler to offer the highest performance profiling and atomic force microscopy available. It offers non-destructive profiling for CMP control and characterization and high aspect ratio depth measurements in a single platform for 200mm and 300mm substrates. This semi-automated platform can be configured to handle a variety of samples including wafers, data storage sliders, and square substrates.
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The Nanosurf Nanite extends Nanosurf's new and innovative AFM professional scanner design to work-intensive industrial applications. When time and throughput are of utmost importance, the automated Nanite system is your answer.
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| With the SUPRA%u2122 range ZEISS has brought the most versatile FESEM to the market for applications in R&D, failure analysis or quality assurance. Ultra high resolution with superb image quality, easy change of operating voltage, excellent probe current stability, fully analytical specimen chambers and easy operation through the Windows® XP based SmartSEM%u2122 professional control software are just a few of the out-standing features of this leading edge technology range of instruments. The SUPRA%u2122 FESEMs with the unique GEMINI® column provide quick, reproducible and reliable results. The proprietary VP technology with the enhanced VPSE detector enables superb imaging and analytical results for non-conducting specimens. |
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| The ULTRA FESEM, based on the SUPRA FESEM comprises a high efficiency, ultra high resolution In-column EsB detector which enables nano-scale compositional BSE imaging. The newly developed Energy selective Backscattered (EsB) detector represents the latest developments of the renowned GEMINI®technology. The ULTRA incorporates the GEMINI® In-lens SE detector for crisp topographic imaging and the EsB detector for clear compositional contrast. Simultaneous real-time imaging and mixing of both signals offers ultimate imaging capabilities. The EsB detector comprises a filtering grid which enables high resolution BSE imaging revealing previously unseen image details. |
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The New and Powerful Combination of FIB and GEMINI® Column
The NVision 40 CrossBeam® professional workstation units the imaging and analytical capabilities of the high resolution field emission GEMINI® SEM with the high performance SIINT zeta FIB column. Together with the new SIINT GIS supporting liquid, solid state and gaseous precursors as well as gas mixing technology and carbon free SiO2 deposition the NVision 40 represents a powerful tool for 3D nanoscale high resolution imaging, structuring and analytics. The NVision 40 features a dome type chamber design and a pendulumn vibration insulation system for enhanced stability. Numerous access ports for various detectors (EDS, EBSD, STEM, 4QBSO) as well as sample manipulation and probing systems ensure full support for all your analytical and micromanipulation needs. These versatile features and flexible upgrade possibilities make the NVision 40 a highly valuable platform for your today's and future nanotechnology needs.
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| The ZEISS CrossBeam® systems deliver unrivalled accuracy for cross section and localised TEM lamella preparation in semiconductors, metals, ceramics and other bulk materials. The unique CrossBeam® systems combine the unequalled imaging power of the proprietary GEMINI® field emission column with the sophisticated high performance Focussed Ion Beam column into one extraordinary powerful system. The unique live imaging capabilities over the entire magnification range during FIB operation gives full control when working on critical samples. A range of options assures that the CrossBeam® can be configured for demanding applications. The CrossBeam® is the ultimate 3-D nanoscale analysis and inspection tool. |
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The Mobile S afm is a whole new way to look at atomic force microscopy. Mobility. Ease of use. Sleek design. Modern and well-integrated professional software. Unsurpassed support and reliability. And a price much lower than you'd pay for a comparable AFM system.
World's first battery-powered AFM!
Announcing a new dimension in atomic force microscopy: the Mobile S battery-powered AFM.
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Materials microscopy is following new rules. The basis: the newly developed systems platform Axio Imager from Carl Zeiss, designed for quality control, quality assurance, materials analysis, and for the development of new materials. Ideal for routine applications and research, Axio Imager is setting new standards in materials microscopy.
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BioScope II
Easy-to-use life science AFM supporting a wide range of optical techniques, including inverted confocal and TIRF systems.
BioScope SZ
Unmatched high resolution imaging for life science applications with closed-loop control for "pulling" techniques.
Dimension 3100
Accepts samples up to 200mm for semiconductor wafers, lithography professional masks, magnetic media, CDs/DVDs, biomaterials, and optics.
Electrochemical SPM
Line of powerful SPMs for studying real-time, in situ electrochemical processes, with bipotentiostat/galvanostat and liquid cells.
EnviroScope
AFM with a sealed hermetic sample chamber for control of sample atmosphere and temperature.
Innova SPM
The Innova scanning probe stereo microscope (SPM) delivers high-resolution scanning and a wide range of functionality for physical, materials,. And life sciences, all at a much lower price than comparable systems.
MultiMode
The world's best-selling SPM, providing a full range of atomic force microscopy and scanning tunneling microscopy technique. |
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The infinity-corrected objectives offer increased resolution when compared to Mitutoyo´s M Plan Apo series.
* Long working distances
* High Performance
* M26 x 0.706 mm thread (Mitutoyo compatible)
* 95 mm parfocal length |
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Scans and Positions Objectives with Sub-nm Resolution
High Linearity and Stability with Direct-Measuring Capacitive detection
Travel to 460 µm, Fast Response & Settling Time
Frictionless Precision Flexure Guiding System
Enhanced Guiding Precision for Better Focus Stability
Ask about DIC Prism Holder Option
Controller Compatible with MetamorphTM Imaging Software
Quick Lock Adapter for Easy Attachment |
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The EVO® systems represent the latest developments in SEM technology. The new high resolution Optibeam® multi mode column with the sharp conical objective lens enables superior imaging solutions for a wide range of applications and makes the EVO® the most effective analytical SEM currently available. The new XVP® (eXtended Variable Pressure) capability exceeds the limitations of other VP and LV instruments preventing dehydration damage in life science, pharmaceutical and geo-technology applications. The EP models offer pressures up to 3000Pa enabling live imaging of dynamic processes. The future assured upgrade paths ensure that the EVO® series can develop with your applications.
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Innova SPM
The Innova scanning probe industrial microscope (SPM) delivers high-resolution scanning and a wide range of functionality for physical, materials, and life sciences, all at a much lower price than comparable systems. Innova scans from sub-micron levels up to 90 microns, with proprietary closed-loop scan-linearization that approaches open-loop levels, all without the need to change professional scanner hardware. The integrated high-resolution color optics and programmable, motorized Z-stage make finding features and changing tips or samples fast and easy. The Innova's high-end functionality, compact footprint, and moderate cost make it one of the best value SPMs available today. |
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The LIBRA® EFTEM range with In-column OMEGA energy professional filter concept and Koehler illumination comprises the LIBRA® 200 FE and the LIBRA® 120. The LIBRA® 200 FE combines the versatility of the unique In-column 2nd order corrected OMEGA energy filter with a high brightness field emission electron emitter. The 2nd order corrected OMEGA energy filter allows unrivalled isochromatic specimen viewing areas and diffraction acceptance angles at sub-eV energy resolution.
The LIBRA® 120 combines proven flexibility, improved dry vacuum system and Windows® based user interface to ensure maximum information content with ease of operation.
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FEM microscopes, X-ray microscopes, Electron microscopes
