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PVD deposition machine / PECVD / arc evaporation / magnetron sputtering
PVD deposition machine

Goldstone Vacuum has 25 years’ experiences in vacuum deposition field since 1994, who is one of the leading companies in the field of magnetron sputtering coating technology. With its advanced and reliable PVD technology, customizing ...

CVD deposition machine / thin-film
CVD deposition machine
ULC - CVD

UL-Coat equipment It is used for thin film coatings. Atmospheric plasma is a source of chemically reactive species. Injecting a precursor into a plasma leads to the creation of a surface coating. SiO2 thin film coating Other materials ...

MOCVD deposition machine / sputtering / thin-film / with rotating cathodes
MOCVD deposition machine
TurboDisc EPIK 868

Combines Maximum Capital & Footprint Savings with Leading-Edge Performance Veeco’s new EPIK 868 MOCVD system is the LED industry’s highest productivity MOCVD system that reduces cost per wafer approximately 22% compared to previous generations. ...

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VEECO
PVD deposition machine / PECVD / electrostatic / vacuum
PVD deposition machine
Titan Deposition

The production proven Titan Deposition is a loadlocked deposition system with a vacuum cassette elevator. It can be configured for PECVD, HDCVD, PVD, or ALD. The Titan Deposition provides innovative, and leading edge processes in a small ...

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Trion Technology
PECVD deposition machine / diamond-like carbon / vacuum / for optoelectronics
PECVD deposition machine
DLC

LEYBOLD OPTICS DLC is a high-vacuum plasma-enhanced chemical vapor deposition (PECVD) system for the application of anti-reflective (AR) coatings mainly used within infrared (IR) applications for thermal imaging systems. Industry leaders ...

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Bühler Leybold Optics
PECVD deposition machine
PECVD deposition machine

Application The PECVD pilot coater is intended for producing p-i-n stacks of amorphous hydrogenated silicon on metal foils. The coatar is used as an experimentation tool for optimization of plasma enhanced chemical vapour deposition ...

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Sidrabe Inc.
PECVD deposition machine / sputtering / diamond-like carbon / vacuum
PECVD deposition machine
i600S

Features UBM Sputtering system for DLC Excellent surface morphology and good wear resistance Fully automation and compiling database Target size : 406.4mm x 127mm x 12mmt System size : 2.6m(L) x 2.3m(W) x 1.9m(H)

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ISYS
PECVD deposition machine / vacuum
PECVD deposition machine
NPE-4000

NANO-MASTER, Inc. PECVD systems are capable of depositing high quality SiO2, Si3N4, or DLC films on up to 8” diameter substrate sizes. To generate plasma, it uses RF shower head electrode or Hollow Cathode RF plasma source with Fractal ...

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NANO-MASTER
PECVD deposition machine / PVD
PECVD deposition machine
350 kHz

Most important Features: Combined PVD & PECVD process - to deposit very smooth coatings Special Si containing gas line - controlled by additional Mass Flow Controller Silicon increases heat resistance Silicon decreases internal stress ...

CVD deposition machine / thin-film
CVD deposition machine
AltaCVD High Temp®

AltaCVD High Temp® performs HTCVD deposition commonly used in the fabrication of semiconductors, LED and MEMS. This is a flexible and cost effective system which can be used stand alone or combined with our innovatives AltaCVD® chambers. AltaCVD ...

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Altatech Semiconductor