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| Our helmets and visors are designed for a perfect fit with our hearing protectors. They are also designed for optimal comfort, even in situations where you need to protect head, eyes and ears. |
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This type of protection prevents risks to the eye and the face against impact from particles or projections of liquid.
It offers unique protection against electric short-circuit arc.
We create face shields that are technically "perfects" and accentuate our research on comfort, lightness and aesthetics. |
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Peltor helmets & visors - world class protection
Peltor offers a first-rate range of safety helmets and visors. Thanks to great feedback from our loyal customers, this range is continually being improved, and we're always striving for the very best in safety and comfort in all kinds of working environments.
Our helmets and visors are designed for a perfect fit with our hearing protectors. They are also designed for optimal comfort, even in situations where you need to protect head, eyes and ears.
market, either alone, or in combination with Peltor hearing protectors. |
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Protective browguard with ratchet headgear. Front sweatband and back confort foam pad. To be used together with the visors ACC930CL (clear) or ACC930TL (smoke).
EN166 (BT, optical class 1).
With clear visor: EN170 (2-1.2) with smoke visor: EN172 (5-3.1). |
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Supervizor
A robust, heavy-duty, helmet mounted faceshield range with hearing protection compatibility
Compatible with wide range of helmet designs (size, shape and geometry)
Visor fixing method is secure and allows easy visor replacement
Full-face protection: optional chinguard versions available for added protection
Creased visor eliminates gaps and visor profile follows contours of the face for maximum protection, allowing full unrestricted head movement
Design allows the visor to be tilted whilst leaving the earmuffs in place covering the ears. It also facilitates the wearing of the earmuffs without compromising the attenuation, whilst maintaining a maximum area of facial coverage
Visor selection can be tailored to the specific hazard/application: mechanical, chemical, heat etc.
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Preventing Defects from Occuring: Mask Inspection
The photomask is one of the most important tools of photolithography. The mask contains the original image of the structures, which are transferred several thousand times to the individual chips during the exposure of the wafer. To create the structures of a microchip, the patterns of up to 40 different photomasks are projected step by step on the wafer.
Even minute defects in the layout of a single mask used in this process can render all chips in the exposed wafers unusable resulting in enormous losses. That is why it is critical to inspect the mask for defects and eliminate them before the mask is used in a scanner/stepper. The best way to reliably control quality at this stage is to optically emulate the photolithographic process with aerial imaging.
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Carl Zeiss' E-Beam based mask repair tool meets all requirements for repair of advanced mask technologies.
MeRiT MG as Multi Generation system offering highest precision for current and future nodes.
Requirements for Advanced Mask Repair
- High resolution etching and deposition
- Support of small features sizes (< 65nm)
- Low transmission loss
- High resolution and non destructive defect review
- Capability to support multiple processes
- Support all future lithography approaches and mask materials (157nm, EUV, EPL, LEEPL, S-FIL)
- High Throughput |
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| ... products without technical information |
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| ... products without technical information |
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The concept of Macro Mask - Welding is based on the Laser Transmission Welding by analogy to other existing laser welding concepts. A curtain of laser light sweeps over a customer specific mask. The components are precisely joined where the laser is allowed to pass through the mask.
This concept enables the precise assembly of structured plastic parts without thermal stress in the covered area. Neither Adjustment System or Vision System are required compared to Micro Mask - Welding. The mechanic alignment of the components with the mask is sufficient to achieve the required results. |
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