|
|
ANGSTROM SCIENCES magnetrons are recognized as the new standard for thin film sputtering. In addition to their advanced features such as profiled magnets, turbulent water flow, and solid stainless steel construction, they offer a host of other performance efficiencies as well.
· Ultra Compact Design
· Easily Configured For Internal Or External Mount
· Available For Target Diameters 1 Through 16 Inches
· Quick & Easy Target Changes
· Low Pressure / High Power operation
· High Rates & Performance
· Greater Target Utilization
· Greater Film Uniformity – routinely ±3 to ±5 % range
Cathode Styles
Indirect cooled/Standard
Direct cooled
Direct cooled/Indirect cooled
Ultra High Vacuum
High Temperature
High Power Pulsed
High Power RF
CD/DVD
Rotary
Diode
Magnetic Options
Standard
High Utilization
Balanced
Unbalanced
Mag II
High Rate
High Power
Low Pressure
Mounting Options
Internal
External
Assembly Options
Single
Cluster
Custom |
|
ANGSTROM SCIENCES magnetrons are recognized as the new standard for thin film sputtering. In addition to their advanced features such as profiled magnets, turbulent water flow, and solid stainless steel construction, they offer a host of other performance efficiencies as well.
·Ultra Compact Design - Ideal For Retrofit Applications
·Easily Configured For Internal Or External Mount
·Available For Target Diameters 1 Through 16 Inches
·Quick & Easy Target Changes
·Low Pressure / High Power operation
·High Rates & Performance
·Greater Target Utilization
·Greater Film Uniformity – routinely ±3 to ±5 % range
TOTAL COMMITMENT
At Angstrom Sciences, we design, engineer, and manufacture our own complete line of magnetron sputtering cathodes for thin film deposition. It is our core business, and we are totally committed to making sure it is done right, every step of the way. So we can assure you of the quality and reliability of every product you buy from us. We stand ready to provide you any help you may need in specification, installation, start-up, and service.
|
|
Angstrom Sciences has developed a rotating cylindrical magnetron assembly that is compact, economical, and lightweight. And, by utilizing the patented technology already incorporated into our other magnetrons, we can provide you with excellent deposition, optimum target utilization (85%+), and inherent power savings.
The Onyx-Revolution has been customized for Flat Panel Display, Web Coating and Solar Cell applications.
Complete assemblies are available from 3”-6” (76.2 mm-152.4 mm) in diameter and up to 154” (4 m) in length.
Other features include:
High Magnetic Field provides a low operating voltage for reduced power requirements.
An optimized electrical transfer design to deliver high power while avoiding arcing as well as reduced brush wear and debris.
An NW quick connect water-to-vacuum seal for Quick target changes, shorter down times and increased production.
A universal and cost effective magnet design with customized turnarounds.
Lightweight, easily-serviced product with off-the-shelf components for low-cost, long-term investment and reliability.
For more information on our rotating cylindrical design, complete our application questionnaire or contact a product manager at 1.412.469.8466.
|
|
For processes that coat broad physical substrates or that need to achieve extremely high throughput, Angstrom Sciences offers the perfect solution. Our linear magnetrons deliver the same unparalleled performance that has made Angstrom Sciences the world leader in magnetron sputtering technology for the past two decades.
The Angstrom Advantage is fully incorporated into each of these state-of-the-art production tools. They operate at very low pressure and exceptionally high power, and they provide the perfect balance of uniformity, utilization and rate for any application.
Angstrom Sciences provides a full range of configurations to meet your production needs.
Sizes
Width 1.5” – 16” 38mm – 407mm
Length up to 20ft up to 6m
Cathode Styles
Indirect cooled
Direct cooled/Indirect cooled
Ultra High Vacuum
High Temperature
High Power Pulse
High Power RF
Diode
Magnetic Options
Standard
High Utilization
High Uniformity
Magnetic Stages I, II, III
Moving Magnetics
High Rate
High Uniformity
High Power
Low Pressure
Balanced
Unbalanced
Mounting Options
Internal
External
Assembly Options
Single
Multiple
Contact an Angstrom Sciences Product Manager at 1.412.469.8466 to discuss your specific operational requirements, or Request a Quote now.
|
|
Dexter R-Mag™ Magnetron,U.S. Patent 5,865,970
UP TO FOUR TIMES MORE PRODUCTIVITY THROUGH ENHANCED MAGNETICS
Our patented quadrature design produces higher fields than conventional magnetrons thus lowering your costs.
>The higher fields allow for thicker targets. Thicker targets can drastically increase run time between target changes while saving thousands in target costs.
>Magnet assemblies are built with carefully matched magnets that are calibrated to within +/- 1%.
>Magnet assemblies can be adjusted in any location to obtain the desired uniformity profile along the length.
>Magnet assemblies are designed for direct exposure with the cooling water.
>Magnets are mechanically protected with SS cladding.
>Magnet bar is designed with SS to minimize corrosion.
>Turn around portion of the assembly is designed for simple replacement. This allows us to work with the end user to optimize the turnaround erosion for maximum target utilization. This saves time and money! The replaceable turnaround also allows the end user to quickly repair and replace this portion of the bar if it becomes damaged.
>Readily adjusted to run with the larger ID targets
>Each magnet bar is individually mapped and certified to meet the uniformity requirements.
>Optional: Unbalanced or balanced magnetrons |
|
Dexter's patented circular magnetron guns (T-Guns™) have been specifically engineered for the demanding requirements of data storage media producers. Integration with a new system or retrofitting an existing system is facilitated by our innovative, patented design and control interface.
>Programmable speed: 0 to 500 RPM
>Superior mechanical robustness to withstand the high mechanical loading created by the high strength manget array/target interaction
>High radial anisotropy at ID, MD and OD during sputter
>Programmable magnet phasing
>Power: 120 VAC 60 Hz, 50Hz
>Optimized for dual cathode sputtering
>Designed to retrofit Intevac® 250B and Canon ANELVA 3010 systems
>Typical Deposition Rate: 61 A/kWsec at 3 kW
>Sputter power 3 kW
>Station includes two rotary mechanisms, vacuum chamber, target clamps, spacers and stand-offs
>Simplified, lower cost, rotating magnetron system
>Robust mechanical structure will work with low PTF SUL materials
>Programmable recipe variables include: rotational speed and phase angle
>Dexter target removal/load tool required
*Note that Dexter also offers the patented Z-Gun Magnetron Sputter Source. |
|
ANGSTROM SCIENCES magnetrons are recognized as the new standard for thin film sputtering. In addition to their advanced features such as profiled magnets, turbulent water flow, and solid stainless steel construction, they offer a host of other performance efficiencies as well.
· Ultra Compact Design
· Easily Configured For Internal Or External Mount
· Available For Target Diameters 1 Through 16 Inches
· Quick & Easy Target Changes
· Low Pressure / High Power operation
· High Rates & Performance
· Greater Target Utilization
· Greater Film Uniformity – routinely ±3 to ±5 % range
Cathode Styles
Indirect cooled/Standard
Direct cooled
Direct cooled/Indirect cooled
Ultra High Vacuum
High Temperature
High Power Pulsed
High Power RF
CD/DVD
Rotary
Diode
Magnetic Options
Standard
High Utilization
Balanced
Unbalanced
Mag II
High Rate
High Power
Low Pressure
Mounting Options
Internal
External
Assembly Options
Single
Cluster
Custom |
|
ANGSTROM SCIENCES magnetrons are recognized as the new standard for thin film sputtering. In addition to their advanced features such as profiled magnets, turbulent water flow, and solid stainless steel construction, they offer a host of other performance efficiencies as well.
·Ultra Compact Design - Ideal For Retrofit Applications
·Easily Configured For Internal Or External Mount
·Available For Target Diameters 1 Through 16 Inches
·Quick & Easy Target Changes
·Low Pressure / High Power operation
·High Rates & Performance
·Greater Target Utilization
·Greater Film Uniformity – routinely ±3 to ±5 % range
TOTAL COMMITMENT
At Angstrom Sciences, we design, engineer, and manufacture our own complete line of magnetron sputtering cathodes for thin film deposition. It is our core business, and we are totally committed to making sure it is done right, every step of the way. So we can assure you of the quality and reliability of every product you buy from us. We stand ready to provide you any help you may need in specification, installation, start-up, and service.
|
|
Angstrom Sciences has developed a rotating cylindrical magnetron assembly that is compact, economical, and lightweight. And, by utilizing the patented technology already incorporated into our other magnetrons, we can provide you with excellent deposition, optimum target utilization (85%+), and inherent power savings.
The Onyx-Revolution has been customized for Flat Panel Display, Web Coating and Solar Cell applications.
Complete assemblies are available from 3”-6” (76.2 mm-152.4 mm) in diameter and up to 154” (4 m) in length.
Other features include:
High Magnetic Field provides a low operating voltage for reduced power requirements.
An optimized electrical transfer design to deliver high power while avoiding arcing as well as reduced brush wear and debris.
An NW quick connect water-to-vacuum seal for Quick target changes, shorter down times and increased production.
A universal and cost effective magnet design with customized turnarounds.
Lightweight, easily-serviced product with off-the-shelf components for low-cost, long-term investment and reliability.
For more information on our rotating cylindrical design, complete our application questionnaire or contact a product manager at 1.412.469.8466.
|
|
For processes that coat broad physical substrates or that need to achieve extremely high throughput, Angstrom Sciences offers the perfect solution. Our linear magnetrons deliver the same unparalleled performance that has made Angstrom Sciences the world leader in magnetron sputtering technology for the past two decades.
The Angstrom Advantage is fully incorporated into each of these state-of-the-art production tools. They operate at very low pressure and exceptionally high power, and they provide the perfect balance of uniformity, utilization and rate for any application.
Angstrom Sciences provides a full range of configurations to meet your production needs.
Sizes
Width 1.5” – 16” 38mm – 407mm
Length up to 20ft up to 6m
Cathode Styles
Indirect cooled
Direct cooled/Indirect cooled
Ultra High Vacuum
High Temperature
High Power Pulse
High Power RF
Diode
Magnetic Options
Standard
High Utilization
High Uniformity
Magnetic Stages I, II, III
Moving Magnetics
High Rate
High Uniformity
High Power
Low Pressure
Balanced
Unbalanced
Mounting Options
Internal
External
Assembly Options
Single
Multiple
Contact an Angstrom Sciences Product Manager at 1.412.469.8466 to discuss your specific operational requirements, or Request a Quote now.
|
|
Dexter R-Mag™ Magnetron,U.S. Patent 5,865,970
UP TO FOUR TIMES MORE PRODUCTIVITY THROUGH ENHANCED MAGNETICS
Our patented quadrature design produces higher fields than conventional magnetrons thus lowering your costs.
>The higher fields allow for thicker targets. Thicker targets can drastically increase run time between target changes while saving thousands in target costs.
>Magnet assemblies are built with carefully matched magnets that are calibrated to within +/- 1%.
>Magnet assemblies can be adjusted in any location to obtain the desired uniformity profile along the length.
>Magnet assemblies are designed for direct exposure with the cooling water.
>Magnets are mechanically protected with SS cladding.
>Magnet bar is designed with SS to minimize corrosion.
>Turn around portion of the assembly is designed for simple replacement. This allows us to work with the end user to optimize the turnaround erosion for maximum target utilization. This saves time and money! The replaceable turnaround also allows the end user to quickly repair and replace this portion of the bar if it becomes damaged.
>Readily adjusted to run with the larger ID targets
>Each magnet bar is individually mapped and certified to meet the uniformity requirements.
>Optional: Unbalanced or balanced magnetrons |
|
Dexter's patented circular magnetron guns (T-Guns™) have been specifically engineered for the demanding requirements of data storage media producers. Integration with a new system or retrofitting an existing system is facilitated by our innovative, patented design and control interface.
>Programmable speed: 0 to 500 RPM
>Superior mechanical robustness to withstand the high mechanical loading created by the high strength manget array/target interaction
>High radial anisotropy at ID, MD and OD during sputter
>Programmable magnet phasing
>Power: 120 VAC 60 Hz, 50Hz
>Optimized for dual cathode sputtering
>Designed to retrofit Intevac® 250B and Canon ANELVA 3010 systems
>Typical Deposition Rate: 61 A/kWsec at 3 kW
>Sputter power 3 kW
>Station includes two rotary mechanisms, vacuum chamber, target clamps, spacers and stand-offs
>Simplified, lower cost, rotating magnetron system
>Robust mechanical structure will work with low PTF SUL materials
>Programmable recipe variables include: rotational speed and phase angle
>Dexter target removal/load tool required
*Note that Dexter also offers the patented Z-Gun Magnetron Sputter Source. |
|
Angstrom Sciences magnetrons are recognized as the new standard of the sputtering industry. Because, in addition to the advanced features provided by the Angstrom AdvantageTM, they offer a host of other performance efficiencies as well.
Versatile Design
Their ultra compact design makes them ideal for virtually any new or retrofit application including the most complex multiple-cathode cluster or the smallest vacuum chamber. Low-impedance heads provide RF, DC, mid frequency DC, and pulse DC power capability. All utilities are maintained at atmosphere and are accessed through standard o-ring compression fittings for ease of installation in any vacuum system.
Lower Pressure, Higher Power
All our magnetrons operate at extremely low pressure, in the 10-4 Torr range and can deliver practical power densities in excess of 300 watts per square inch.
High Rates and Performance
That means they can coat a greater area for their cathode size than other magnetrons. So you can maximize both your coating zone and your target utilization without the kind of trade-off in rate that other magnetrons force you to make.
Greater Performance
Yet these same advanced planar magnetrons can give you target utilization as high as 50%. Our magnetrons also deliver much greater uniformity of deposition – routinely in the 3 to 5% range. One of our research customers has even documented uniformity of 0.1% with Angstrom Sciences magnetrons.
Full Range of Sizes
Angstrom Sciences circular magnetrons are available in 1-16 inch target sizes. The linear magnetrons are available in target widths of 1.5 to 12 inches and in target lengths from 1 to 20 feet.
|
|
Angstrom Sciences’ Rotary Magnetrons are planar sputtering cathodes that contain a rotating magnet pack within the assembly. This rotating array provides a precise magnetic field, for exceptional film uniformity and high target utilization in semiconductor and media storage applications.
Angstrom Sciences’ Rotary Magnetrons are available in 4”, 6”, 6.75”, 8”, 9.25”, 10”, 12”, and 16” Outer Diameters.
Sputtering cathodes are Angstrom Sciences' core business. We are committed to ensuring you have the highest quality deposition tool. So we guarantee every magnetron against flaws in workmanship or materials for 2 years – the longest warranty in the industry – and we stand ready to provide you any help you may need in specification, installation, start-up, and service. |
|
Dexter's rotating magnetron guns (Z-Guns™) have been specifically engineered for the demanding requirements of data storage media producers. Integration with a new system or retrofitting an existing system is facilitated by our innovative, patented design and control interface.
>Programmable speed: 0 to 500 RPM
>Superior mechanical robustness to withstand the high mechanical loading created by the high strength manget array/target interaction
>High radial anisotropy at ID, MD and OD during sputter
>Programmable magnet phasing
>Power: 120 VAC 60 Hz, 50Hz
>Optimized for dual cathode sputtering
>Designed to retrofit Intevac® 250B and Canon ANELVA 3010 systems
>Typical Deposition Rate: 61 A/kWsec at 3 kW
>Sputter power 3 kW
>Station includes two rotary mechanisms, vacuum chamber, target clamps, spacers and stand-offs
>Magnet array capable of 2.625 in (67 mm) of linear travel
>Easy target removal without special tooling
>Programmable recipe variables include: rotational speed, phase angle and linear position |
|
Angstrom Sciences magnetrons are recognized as the new standard of the sputtering industry. Because, in addition to the advanced features provided by the Angstrom AdvantageTM, they offer a host of other performance efficiencies as well.
Versatile Design
Their ultra compact design makes them ideal for virtually any new or retrofit application including the most complex multiple-cathode cluster or the smallest vacuum chamber. Low-impedance heads provide RF, DC, mid frequency DC, and pulse DC power capability. All utilities are maintained at atmosphere and are accessed through standard o-ring compression fittings for ease of installation in any vacuum system.
Lower Pressure, Higher Power
All our magnetrons operate at extremely low pressure, in the 10-4 Torr range and can deliver practical power densities in excess of 300 watts per square inch.
High Rates and Performance
That means they can coat a greater area for their cathode size than other magnetrons. So you can maximize both your coating zone and your target utilization without the kind of trade-off in rate that other magnetrons force you to make.
Greater Performance
Yet these same advanced planar magnetrons can give you target utilization as high as 50%. Our magnetrons also deliver much greater uniformity of deposition – routinely in the 3 to 5% range. One of our research customers has even documented uniformity of 0.1% with Angstrom Sciences magnetrons.
Full Range of Sizes
Angstrom Sciences circular magnetrons are available in 1-16 inch target sizes. The linear magnetrons are available in target widths of 1.5 to 12 inches and in target lengths from 1 to 20 feet.
|
|
Dexter's rotating magnetron guns (Z-Guns™) have been specifically engineered for the demanding requirements of data storage media producers. Integration with a new system or retrofitting an existing system is facilitated by our innovative, patented design and control interface.
>Programmable speed: 0 to 500 RPM
>Superior mechanical robustness to withstand the high mechanical loading created by the high strength manget array/target interaction
>High radial anisotropy at ID, MD and OD during sputter
>Programmable magnet phasing
>Power: 120 VAC 60 Hz, 50Hz
>Optimized for dual cathode sputtering
>Designed to retrofit Intevac® 250B and Canon ANELVA 3010 systems
>Typical Deposition Rate: 61 A/kWsec at 3 kW
>Sputter power 3 kW
>Station includes two rotary mechanisms, vacuum chamber, target clamps, spacers and stand-offs
>Magnet array capable of 2.625 in (67 mm) of linear travel
>Easy target removal without special tooling
>Programmable recipe variables include: rotational speed, phase angle and linear position |
|
|
|
