{{#pushedProductsPlacement4.length}} {{#each pushedProductsPlacement4}}
{{product.defLight}}
{{#if company.requestButtonsVisibility.requestButtonQuestion == "ACTIVE"}}
{{elseif company.requestButtonsVisibility.requestButtonWhereToBuy == "ACTIVE"}}
{{/if}}
{{product.productLabel}}
{{product.model}}

{{#each product.specData:i}} {{name}}: {{value}} {{#i!=(product.specData.length-1)}}
{{/end}} {{/each}}

{{{product.idpText}}}

{{productPushLabel}}
{{#if product.newProduct}}
{{/if}} {{#if product.hasVideo}}
{{/if}}
{{/each}} {{/pushedProductsPlacement4.length}}
{{#pushedProductsPlacement5.length}} {{#each pushedProductsPlacement5}}
{{product.defLight}}
{{#if company.requestButtonsVisibility.requestButtonQuestion == "ACTIVE"}}
{{elseif company.requestButtonsVisibility.requestButtonWhereToBuy == "ACTIVE"}}
{{/if}}
{{product.productLabel}}
{{product.model}}

{{#each product.specData:i}} {{name}}: {{value}} {{#i!=(product.specData.length-1)}}
{{/end}} {{/each}}

{{{product.idpText}}}

{{productPushLabel}}
{{#if product.newProduct}}
{{/if}} {{#if product.hasVideo}}
{{/if}}
{{/each}} {{/pushedProductsPlacement5.length}}
laser photolithography system
laser photolithography system
PhableR 100

... periodic structures in a non-contact, proximity photolithography system. The resolution obtained with the PhableR 100 is essentially the same as that of a DUV projection lithography system, ...

See the other products
OAI
UV photolithography system
UV photolithography system
356

The Model 356 Photolithography UV Intensity & Energy Meter for Contact Mask Aligners is a microprocessor-based monitor that allows storage and recall of multiple exposure parameters (intensity, energy, ...

See the other products
OAI
nanometric photolithography system
nanometric photolithography system

The Nano-imprint Photolithoraphy System is a modular add-on which is developed based on NIL technology. It is specifically built to be used on OAI mask aligner systems. The unit is was developed by Hewlett ...

See the other products
OAI
UV-NIL photolithography system
UV-NIL photolithography system
EVG®620

The EVG620 allows for imprint processes with stamps to substrates ranging from small chip size pieces up to 150 mm in diameter. Configurations for nanotechnology applications can include release mechanisms for stamps in addition to programmable ...

See the other products
EV Group
UV-NIL photolithography system
UV-NIL photolithography system
EVG®6200∞

The EVG6200∞ is the culmination of EV Group's new aligner-technology roadmap. A variety of stamps and substrates sizes from 75mm-to-200mm can be accommodated on the EVG6200∞ for nanoimprint lithography applications. Features Nanoimprint ...

See the other products
EV Group
UV-NIL photolithography system
UV-NIL photolithography system
IQ Aligner®

The IQ Aligner UV-NIL System allows for micromolding and nanoimprinting processes with stamps and wafers from 150 mm to 300mm diameter. Uniform contact force for high yield large area printing is provided by EV Group's ...

See the other products
EV Group
UV-NIL photolithography system
UV-NIL photolithography system
EVG®770

... parallelism for contact-free wedge compensation Chuck movement via a non-contact bearing system to reduce particle contamination High-precision alignment system with accuracy within +/-500 nm; Fine Alignment: ...

See the other products
EV Group
UV-NIL photolithography system
UV-NIL photolithography system
EVG®720

... EVG720 system with SmartNIL technology is ideally suited for volume production of optics, photonics, light emitting diodes (LED), microfluidics and other bioMEMS devices, as well as advanced data storage. EVG® 720 automated ...

See the other products
EV Group
UV-NIL photolithography system
UV-NIL photolithography system
EVG®7200

... Nanoimprint Solution for Nanopatterning: The EVG7200 system leverages EVG's innovative SmartNIL technology and EVG's materials expertise to enable mass manufacturing of micro- and nanoscale structures. The system ...

See the other products
EV Group
UV-NIL photolithography system
UV-NIL photolithography system
EVG®7200 LA

... substrate sizes. The EVG7200 Large-Area UV Nanoimprint System marks the technology’s next milestone as it allows imprinting on Gen 2 (370 mm x 470 mm) panel size substrates. The SmartNIL-based system ...

See the other products
EV Group
UV-NIL photolithography system
UV-NIL photolithography system
HERCULES®NIL

... wafers are loaded into the tool and fully processed nanostructured wafers are returned. To optimize the process chain, the system can be used to fabricate multiple-use soft stamps - which are a cornerstone for high-volume ...

See the other products
EV Group
3D photolithography system / laser
3D photolithography system
Photonic Professional

The universal feature of Nanoscribes laser lithography units is auto-focus. Due to patented technology, the interface between glass substrate and photo-resist is accurately and autonomously calculated. This provides a base for dependable ...

See the other products
Nanoscribe
3D photolithography system / laser
3D photolithography system
Photonic Professional GT

... structures with the tiniest sub-micrometer features possible. These systems use the high precision galvo technology that has a galvanic mirror system to deflect the laser focus position laterally, ...

See the other products
Nanoscribe
3D photolithography system / laser
3D photolithography system
FX-86SH2/86S2

The FX-86SH2 incorporates techniques from both the FX-67S, which is ideal for high-resolution panel manufacturing, and the FX-101S, which supports extra-large plate applications, enabling high-resolution large-sized panel manufacturing. ...