Plasma sources

14 Industrial products | 4 Companies
 
 
ME.RO.
DC / AC power supply: for plasma sputtering  4 - 15 kW | MRVP ME.RO.

This type of generators represent a new industrial standard for applications
in under vacuum metallizing chambers. The configuration of the power ...

DC / AC power supply: for plasma sputtering  10 kW | MRVP ME.RO.

LOW-FREQUENCY POWER SUPPLIES FOR PLASMA APPLICATIONS

COMPACT SIZE AND FLEXIBILITY OF USE
The POWER SUPPLY, thanks to the compact size and its modular form, can be mounted inside a cabinet which is containing other equipment, or in a special cabinet containing also the ...

DC / AC power supply: for plasma sputtering  20 kW | MRVP ME.RO.

LOW-FREQUENCY POWER SUPPLIES FOR PLASMA APPLICATIONS

COMPACT SIZE AND FLEXIBILITY OF USE
The POWER SUPPLY, thanks to the compact size and its modular form, can be mounted inside a cabinet which is containing other equipment, or in a special cabinet containing also the ...

Arcotec
AC / DC switch-mode power supply for plasma surface treatment Arcotec

The plasma generator is applied especially for the in-line pre-treatment of moulded parts, profiles, grooves.
...

Jeol
Plasma source for surface treatment (PVD, CVD) Jeol

The use of plasma for enhancing the quality and function of thin film production by physical vapor deposition ...

Hüttinger Electronik
AC / DC power supply: voltage rectifier for plasma deposition  1 000 - 8 000 kW | TruPlasma Highpulse 4000 series Hüttinger Electronik

TruPlasma Highpulse Series 4000

The TruPlasma Highpulse Series 4000 product family of DC power supplies is the ideal choice for HIPIMS processes. HIPIMS ...

AC / DC power supply: voltage rectifier for plasma processing  2 - 120 kW, 800 V | TruPlasma DC 3000 series Hüttinger Electronik

DC Generators TruPlasma DC Series 3000

The TruPlasma DC Series 3000 is especially designed for ambitious plasma ...

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