Process photometer
PUV3402
ABB France
The Next Generation of On-Line Process Photometers.
Multiwave™ Process Photometers are designed to provide on-line measurements of gas or liquid components, in simple or complex process streams, for process control, product quality assurance, safety, catalyst protection and area monitoring.
The Multiwave™ is a fixed filter photometer that utilizes optical filters to make continuous measurements. The single beam, dual wavelength concept used in the Multiwave™ compensates for source and detector aging and the obstruction of cell windows, while allowing the sample cell to be isolated from the electronics.
The Multiwave™ design takes the single beam, dual wavelength concept one important step further, by adding up to eight filters to the filter wheel. This improved method provides more measurement solutions than a conventional single component process photometer. The use of multiple wavelengths enables the Multiwave™ to compensate for numerous interferences and perform multiple component applications.
The new Multiwave™ Process Photometers offer even more performance,
operating efficiency and versatility to the user. The Multiwave™ line features two basic models, each offering a wide range of applications capability.
PIR3502 Multiwave™ Photometers can be applied to Infrared and Near
Infrared measurements.
PUV3402 Multiwave™ Photometers are designed for the Ultraviolet and
Visible spectral regions.
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