CVD deposition machine ULCoat

By injecting a precursor into the plasma post-discharge, ULCoat deposits thin layers onto the treated surface. ULCoat is a system that vaporizes and injects a precursor under the plasma nozzle. The ULCoat is used coupled with an OMEGA ULS generator. The standard unit has been designed to deposit SiOx using a metal-organic precursor. However, other recipes can be developed upon request. AcXys Technologies’ process development lab is at your service to develop the application that meets your needs under a research and development contract. ULCoat technology – Coupled to ULS OMEGA module – Used for thin layers deposition – Adjustable thickness from 50 to 1000 nanometers – Even thickness with +/- 2% variation – Processing speed for treatment up to 200 nm.cm2 / s – Standard version is optimized for SiOx deposits Injection nozzle Precursor flow is monitored prior to its injection into plasma. This module combines the following elements: – Precursor tank – Precursor flow control – Gas flow control – Heating component (optional) Intuitive digital interface touchscreen – Integral touchscreen (remote if OEM) – Intuitive controlling – Multilingual interface – Error detection and troubleshooting – Real time display of instructions Compatible gas – Air – Nitrogen – Other gas mixtures