PVD deposition machine / sputtering / thin-film
DP1100 ALLIANCE CONCEPT

Characteristics

  • Method:

    PVD

  • Technology:

    sputtering

  • Deposition type:

    thin-film

Description

Based on our DP PVD sputtering range of machines, we’ve developed a larger system with a 1100 mm diameter chamber.

Equipped with 300 mm cathodes, this equipment is aimed at the deposition of uniform thin films on 200 mm substrates. Various high level technologieshave been tuned using this machine such as HIPIMS power supply and plasma emission spectroscopy for reactive process regulation.

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