Thin film CVD deposition machine
AltaCVD 200
Altatech Semiconductor
Specifications
* 200mm chamber
* Direct liquid injection of precursors with advanced vaporization system
* Wide spectrum of deposited materials through a wide range of vaporization and deposition temperatures
* Thermal CVD or RF-enhanced deposition (PECVD and PEALD)
* Low frequency plasma available for material mechanical/electrical/optical properties tuning
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