Axcelis Technologies
  • Products

Ion implanter: high energy
0.01 - 4 MeV | Optima XE Axcelis Technologies

  • ion implanter: high energy 0.01 - 4 MeV | Optima XE Axcelis Technologies
The Optima XE is a high energy, 300mm single wafer implanter offering the full range of implant energies matched to meet the changing needs of advanced logic and memory manufacturing.

- Broadest Energy Range. 10keV to 4MeV energy range provides complete applications coverage for retrograde well, triple well, isolation wells, and channel engineering implants.

- Reliability. Utilizes the reliable production proven RF LINAC accelerator with an installed base of over 550 units worldwide.

- Widest Single Charge Range. Shortest tune time and longest source life enable the highest available throughput.



Exhibitor's categories
standListOtherProduct www di En 2012-05-20-19