Metallurgical microscope
Buehler
* CFI infinity corrected optical design with 60mm parfocal length for increased image contrast, resolution and working distance
* Stand designed to reduce ESD (Electro Static Discharge) issues for sensitive applications
* New 50W Halogen epi-illuminator for brighter images
* Choice of brightfield, darkfield, polarizing or differential interference contrast optical techniques
* Five or six port nosepiece choice to mount CFI LU Plan Fluor Objectives
