Secondary ion mass spectrometer (SIMS) for semiconductor industry
IMS Wf / SCU
CAMECA
The CAMECA IMS Wf / SC Ultra has been specifically designed to meet the increasing needs for dynamic SIMS measurements in advanced semiconductors.
A first requisite to the analysis of advanced semiconductors is the optimization of SIMS analytical conditions for ultra-shallow depth profiling without giving up standard depth profiling applications. CAMECA has therefore developed a SIMS instrument capable of sputtering samples with a large range of impact energies: from high energy (keV range) for thick structures to Ultra-Low Energy (≤ 150eV) for ultra-thin structures. This flexibility in the impact energy choice is available for different well-controlled sputtering conditions (species, incidence angle, etc...).
The design of the CAMECA IMS Wf / SC Ultra is quite unique: it is the only SIMS instrument offering EXtreme Low Impact Energy (EXLIE) capabilities with no compromise on high mass resolution and high transmission.
The IMS Wf model can analyze full 300mm wafers and has a pattern recognition system. It can be equipped with 300mm FOUP or 200mm SMIF pods and be operated remotely fit use in the fab.
The laboratory version, SC Ultra, has manual sample loading.
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