Mask repair system Carl Zeiss SMT
MeRIT

Carl Zeiss' E-Beam based mask repair tool meets all requirements for repair of advanced mask technologies.
MeRiT MG as Multi Generation system offering highest precision for current and future nodes.

Requirements for Advanced Mask Repair
- High resolution etching and deposition
- Support of small features sizes (< 65nm)
- Low transmission loss
- High resolution and non destructive defect review
- Capability to support multiple processes
- Support all future lithography approaches and mask materials (157nm, EUV, EPL, LEEPL, S-FIL)
- High Throughput

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