Performance:
The CLF series generators provide stable process power up to 5 kW. The half-rack supplies operate at any fixed frequency from 20 to 50 kHz. The full- rack models can operate at any fixed frequency from 20 to 450 kHz or auto-tuned up to +/- 15% bandwidth. In many applications, the combination of auto-tune and excess power headroom will allow delivery of power to changing reactive loads without the need for mechanically tuned matching networks.
Applications:
The CLF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.
