CVD deposition machine C30S
thin-filmparylene

CVD deposition machine
CVD deposition machine
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Characteristics

Method
CVD
Deposition type
thin-film, parylene

Description

Ideal for laboratory tests and industrial production of small pieces Versatile equipment with possible upgrade to Multilayer configuration Perfectly suited for: Small and medium-sized components (e.g. in electronics, medical applications etc) Wafers up to ø 200 mm (8 inch) Overall dimensions (L x W x H) - 2100 x 1370 x 2000mm Weight - 350kg Chamber size - ∅ 295 x 370 mm Tooling size - ∅ 260 x 320 mm Max. tooling load - 100kg Dimer load capacity - 150g Pumping capacity - 40 m3/h Power supply required - 3 x 400V + N + PE – 50 Hz 3 x 25A – 15kW Parylene processable - Type: C, D, N, F-VT4, F-AF4 Thermalized chamber – temperature range - 20 – 30°C Options - Compatible with all options

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Exhibitions

Meet this supplier at the following exhibition(s):

Sensor+Test 2024
Sensor+Test 2024

11-13 Jun 2024 Nürnberg (Germany)

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    *Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.