ArF excimer laser for photolithography
193 nm | XLA 300 Cymer

Just as the introduction of water into the process has extended the potential of 193nm lithography, the newest release of Cymer's production-proven, Master Oscillator Power Amplifier (MOPA)-based XL Series is now enabling high volume production immersion lithography down to the 45nm process node levels.

The XLA 300 is Cymer's fourth-generation, leading-edge, 193nm argon fluoride (ArF) laser light source featuring the production-proven, MOPA platform-enabling both ultra line-narrowed bandwidth and up to 90W of output power at an industry-leading 6kHz repetition rate. Higher rep rate of 6kHz enables high throughput to deliver sustained productivity for volume manufacturing.

With the XLA 300 chip design rules can continue to shrink, which leads to faster processing speeds and boosts memory capacity per chip. With the capability to deliver ultra line-narrowed spectral bandwidth of <0.12 pm FWHM, the XLA 300 provides the light that enables high contrast imaging for lithography tools with an numerical aperture (NA) up to > 1.3.