Providing a clear, low-risk path to 130 nm Cymer’s ELS-6010 enables semiconductor manufacturers to leverage their existing KrF experience during the transition to 130 nm design rules. It provides a highly line-narrowed spectral bandwidth of ≤ 0.5 pm (FWHM) and ≤ 1.4 pm 95 percent energy integral. The ELS-6010 enables full image performance from lithography steppers and scanners using lenses with numerical apertures > 0.75.