Fused silica is an ideal material for UV application and is transparent from 220nm to 4.0um. it is characterized by excellent chemical and radiation resistance, low coefficient of thermal expansion, low fluorescence, and resistance to scratch.
• Diameter Tolerance: +0.0/- 0.1
• Wedge Angle: 3'
• Flatness: λ/4 at 633nm per inch diameter
• Surface Quality: 40-20 scratch-dig
• Uncoated