Magnetron for ion sputtering
Dexter Magnetic Technologies

Dexter's rotating magnetron guns (Z-Guns™) have been specifically engineered for the demanding requirements of data storage media producers. Integration with a new system or retrofitting an existing system is facilitated by our innovative, patented design and control interface.

>Programmable speed: 0 to 500 RPM

>Superior mechanical robustness to withstand the high mechanical loading created by the high strength manget array/target interaction

>High radial anisotropy at ID, MD and OD during sputter

>Programmable magnet phasing

>Power: 120 VAC 60 Hz, 50Hz

>Optimized for dual cathode sputtering

>Designed to retrofit Intevac® 250B and Canon ANELVA 3010 systems

>Typical Deposition Rate: 61 A/kWsec at 3 kW

>Sputter power 3 kW

>Station includes two rotary mechanisms, vacuum chamber, target clamps, spacers and stand-offs

>Magnet array capable of 2.625 in (67 mm) of linear travel

>Easy target removal without special tooling

>Programmable recipe variables include: rotational speed, phase angle and linear position