Clean room oven
ESPEC

Used extensively in baking, heat treatment/drying of semiconductor wafers, liquid crystals, disks and other components and devices requiring clean air conditions.

In addition to the standard instrumentation which offers two-step programming, the M-instrumentation allows programmed operation in up to 18 steps.

Class 100 cleanliness is achieved by employing a HEPA filter and a back-to-front laminar circulation system.

The high-performance model (PVHC model) provides stable performance even during heat-up or cooling at high temperatures of 150°C(+302°F) or more.

Compatible with the chamber network, E-BUS system.