Combined modules positioning system Z3TH
XYrotaryvertical

combined modules positioning system
combined modules positioning system
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Characteristics

Number of axes
XY
Features
rotary, vertical
Applications
for wafer inspection and metrology
Other characteristics
combined modules

Description

The Z3TH Combined Module is enlarging the scope of modules that can sit on top of the existing XY platforms. The Z3TH, 4 degrees of freedom module, provides 364° Theta rotation, double Z-axes, a coarse one for wafer loading and unloading, and a fine one for focus adjustment, as well as a Tip and Tilt correction over ±0.1°. This Z3TH module is a nice alternative to piezo based Z actuators, eliminating the hysteresis and non-linearity in open loop while offering better tracking error during movement, repeatability, and move and settle performance yet over much longer travels. The Z3TH module is primarily dedicated to front-end type of applications and provides a right solution to cope with any applications requiring: - Alignment between a process tool and a substrate - Mapping of flatness - Move and settle improvement First applications are related to back-end lithography and wafer process control. Characteristics - 364° Theta rotation - Tip and tilt correction over ±0.1° for leveling and for move and settle improvement - Vacuum feed-through to the chuck level - Double Z integration: coarse travel for loading/unloading and fine travel for focus adjustment - ISO class 1 clean room compatibility - Low radial axial and radial runout of ±1 µm

Exhibitions

Meet this supplier at the following exhibition(s):

BIEMH 2024
BIEMH 2024

3-07 Jun 2024 Bilbao (Spain) Hall 6 - Stand C-04

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    *Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.