Semiconductor resin i-Line

photosensitive

Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution on varied substrates over a large range of resist thickness. Product Summary • Advanced i-Line Resists for Non-reflective Substrates Resist families designed for demanding critical CD (500 nm CD) and robust patterning: • OiR 305 series • OiR 366 series • OiR 906 series • OiR 907 series • Multi-purpose Cross-over g- and i-Line Resists Resist series offering robust patterning for g-line, i-line and broadband (>800 nm CD): • HiPR 6500 series • HPR 510 series • Dyed Resists for Highly Reflective Substrates Resist series offering non-bleaching, high optical densities for CD and notching control on highly reflective substrates: • OiR 906MD • OiR 906HD • OiR 305HC • HiPR 6500GH • HiPR 6500HC • i-Line Resists for Thicker Applications Resist series for thicker film patterning needs ranging from 3 to 13 µm film thickness: • FHi-560EP • GiR 3114 • OiR 305 • OiR 908