Photosensitive resin ArF

for semiconductors

Materials for positive dry and immersion imaging, and negative tone development (NTD) Wide array of high resolution imaging systems for 193 nm exposure including positive dry and immersion imaging and negative tone development (NTD) • High throughput • Superior resolution • Wide process windows • Low defect levels • Vertical profiles • GAR series The GAR series of products are suited to work with a wide array of applications requiring 193nm dry exposure • FAiRS series for PTD The FAiRS series of products are suited to work with a wide array of applications requiring 193nm immersion exposure and positive tone development • FAiRS series for NTD The FAiRS series of products are suited to work with a wide array of applications requiring 193nm immersion exposure and negative tone development