Gas chromatograph for argon (Ar) impurities analysis GOW MAC

Series AR710 HFADD Gas Chromatograph

The Series AR710 HFADD is designed for trace gas analysis of impurities in argon.

Applications: specialty gas manufacturers, industrial processes requiring inert argon, the electronics industry, gas separation plants, air separation plants, nuclear industry, certification of argon purity, semiconductor industry

- Analysis of trace H2, O2, N2, CH4, CO and CO2 in high purity argon (ppb)
- Sensitivity ... H2: < 15 ppb; O2: < 75 ppb; N2: < 100 ppb;
CH4: < 30 ppb; CO: < 200 ppb; CO2: <100 ppb
- Analytical cycle: all components < 10 minutes
- High analytical precision: ± 1% full scale
- Options: automatic or manual operation modes, auto-zero
- On-line monitoring by linking workstation
- Installation: bench or 19" rack
- Power: 110-220 V, 50-60 Hz

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