Combined focused ion beam scanning electron microscope (FIB/SEM)
NB5000 Hitachi High-Technologies Europe

Hitachi High-Technolgies' integrated two beam FIB-SEM instrument, the NB5000, adopts a new a new approach which distinguishes itself significantly from previous instruments of this type. Key to the exceptional performance of the NB5000 is Hitachi's advanced, low aberration FIB column. The low Cs optics and operation up to 40kV maximize the ion current density making ultra-high current, high-speed milling a practical reality. Milling speed not only far exceeds the best available to date, but also provides smaller overall spot size for better control and lower unwanted milling in peripheral areas. This FIB performance also means that large area milling (>200um) is now practically achievable in a timely manner. The vertical FIB column and inclined SEM column also result in significant advantages for many applications. No tilt is required for FIB milling and the high stability stage coupled with enhanced small spot size milling makes ultra-thin sectioning straightforward (with <2nm slices). End point detection is therefore more precise, ultra-thin TEM sample preparation is straightforward and higher spatial resolution serial sectioning is achievable. The automated "Mill and Monitor" system full automates serial sectioning work for simultaneous or alternating FIB and SEM operation. Additionally, fully automated EDX mapping acquisition enables element-resolved 3D visualization. The NB-5000 features advanced electron optics with the in-lens detection technology already proven on Hitachi's highly successful range of FE-SEMs for high quality SEM imaging.