thermal mass flow controller / for liquids / digital
Max.: 100 us gal/min (379 l/min)
Min.: 0 us gal/min (0 l/min)
Max.: 300,000 Pa (44 psi)
Min.: 50,000 Pa (7 psi)
When semiconductor devices get faster, its integration level also increases. As a result higher detail is required in device construction. To meet these criteria, the 300 mm wafer production process is introduced with new materials to enhance efficient productivity. The new trend has produced several varieties of liquid sources and flow rates to be used in the semiconductor manufacturing process.
The Digital series of flow controller utilizes Peltier element to cool the liquid instead of using the more common thermal heating element. This eliminates boiling the chemicals having low boiling point promoting enhanced chemical control. HORIBASTEC has emerged as a world leader in this field and offers a full line up liquid source vaporization control systems through various methodologies including baking, direct injection and mixing to guarantee efficient and stable delivery of vapor to the point of use.