DC / AC power supply:
linear for HF plasma processing Hüttinger Electronic
13560 kHz

Macro Results for Micro Processes

Radio Frequency (RF) generators for plasma excitation are useful for a variety of sputtering and etching applications. Many critical processes can only be successfully performed with RF solutions.

RF generators, with their very high output stability, are used in manufacturing the tiniest of devices, such as semiconductors and micro components.

Listed below are the HUETTINGER generators available in the RF range.

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