DC / AC power supply:
linear for MF plasma processing Hüttinger Electronic

Achievers for Large Areas and High Sputter Rates

Generators in the medium frequency (MF) range combine several advantages:
* Higher process stability than direct current systems,
* More cost effective than RF solutions,
* Ideal in large area sputtering processes with high coating rates,
* In dual magnetron applications, they are the building blocks for architectural glass and thin film coating systems.

As the leading manufacturer of generators for large-area coating worldwide, HUETTINGER offers the best there is in generators in the medium-frequency range.

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