High resolution scanning probe microscope Imago Scientific Instruments

The LEAP Si™ Metrology System is a high-performance atom probe microscope providing 3D, atomic resolution, compositional imaging and analysis to research and industry. Materials are examined by removing and analyzing individual atoms. Atoms are removed by a combination of a high electrical field and either: (1) an ultra-fast voltage pulse or (2) an ultra-fast laser pulse. The LEAP Si employs patented innovations that unlock the power of the 3D atom probe to address previously unsolved measurement challenges in semiconductors, material science, and nanomagnetics. Key features include: largest field of view, highest data rate, excellent mass resolution, and simplified sample preparation using microtip arrays. With the LEAP Si measurements that would have taken months, or been completely impossible, can be accomplished in a matter of hours.

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