JEOL commercialized the world's first FE-EPMA, the JXA-8500F in 2003. This highly regarded FE-EPMA has long been used in various fields, such as: metals, materials and geology in both industry and academia. The JXA-8530FPlus is a third-generation FE-EPMA that comes with enhanced analytical and imaging capabilities. The In-Lens Schottky field emission electron gun combined with new software provides higher throughput while maintaining high stability, thus allowing a wider range of EPMA applications to be achieved with higher resolution.
In-Lens Schottky Plus FEG EPMA version
The In-Lens Schottky Plus FEG EPMA version, with an optimized angular current density, allows for analysis with a large probe current of 2μA or more. The resolution of secondary electron image has been improved even under analytical conditions by automatically adjusting for the correct convergence angle.
Advanced software
A wealth of Microsoft Windows®-based advanced applications systems are available, including:
Trace Element Analysis Program for simpler, optimized analysis of trace elements including adding data collected from up to 5 spectrometers,
Phase Map Maker for automatic creation of phase maps based on principal components,
Non-Flat Surface Analysis Program for automated WDS analysis of specimens with surface irregularities. This is possible due to the large Z travel of the stage (7.5 mm).
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