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Electron beam lithography system Jeol

The JBX-3050MV series is an electron beam lithography system for mask/reticle fabrication that meets the design rule of 45 to 32 nm. This system features pattern writing with high speed, high accuracy and high reliability, achieved by high-end technology.

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Scanning probe microscope Jeol

NMR spectrometer Jeol

Energy dispersive X-ray fluorescence (EDXRF) spectrometer Jeol

Plasma source for surface treatment (PVD, CVD) Jeol