Electron beam source BS-60070DEBS

Electron beam sources / power supplies for electron beam deposition used for creating various types of films, including optical films and electrode coatings. Features Features of the electron beam deposition method The thermal efficiency is quite good due to the heating from direct irradiation of the electron beam onto the deposition material. It is possible to vaporize a variety of materials, including high-melting point metals, oxides, compounds and sublimation materials. Since the deposition material is directly heated in the water-cooled crucible(*), there is no reaction of the boat or crucible as with resistance heating or inductive heating methods. A hearth liner is used in some cases Since high-speed output control is available, it is possible to precisely control the film thickness. In comparison to sputtering and CVD methods, the speed of the film creation is a main feature. This is also useful for creating thick coatings of 1µm or more. Features of JEOL electron beam sources [ Oxides ] Features a beam incidence angle perpendicular to the deposition material, and a high energy-density beam spot that is nearly a perfect circle. Since the high-speed sweeping function is standard, it is suitable for deposition onto sublimation materials and oxides with low thermal conductivity and high melting point. Can obtain excellent melted remains, enabling uniform, reproducible film thickness distributions over a wide area. [ Metals ] Selection from a wide range of crucibles is available, enabling multi-type, large-volume, and high-rate deposition. There is also an electron gun compatible with the lift-off process to limit the temperature increase during film creation.