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chamber furnace / electric / air circulating
SO2-12-F Koyo Thermos Systems

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Characteristics

  • Configuration:

    chamber

  • Heat source:

    electric

  • Atmosphere:

    air circulating

  • Maximum temperature:

    Max.: 450 °C (842 °F)

    Min.: 70 °C (158 °F)

Description

This clean oven processes 300-mm (12-inch) wafers for semiconductor production. With FOUPs, 50 wafers can be fully automatically processed for each chamber. The system can be used for low-temperature processing of polyimide and other materials.
Features

Fully automatic clean oven for FOUP operation
Max 50 wafers per chamber
One robot is available for 2 chambers
2 FOUPs per chamber
High speed wafer transfer by double wafer handling robot