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oxidation furnace / annealing / bell / gas
RLA-1200 Koyo Thermos Systems



  • Function:

    oxidation, annealing

  • Configuration:


  • Heat source:


  • Atmosphere:


  • Other characteristics:

    for the electronics industry

  • Maximum temperature:

    Max.: 1,200 °C (2,192 °F)

    Min.: 400 °C (752 °F)


This lamp annealing system for 4-inch to 8-inch wafers achieves high-quality processing even for use in R&D. Activation and oxidation are available in a vacuum (LP) environment and N2 load-lock atmosphere.

High performance process with R&D
Low-cost system by manual susceptor transfer
Upper & lower cross lamp structure and soaking furnace improve the uniformity of in-plane temperature
4- to 8-inch wafer size is available
Equipped with an operator-friendly high performance control system
Vacuum designed quartz tube enables accurate gas substitution and process at vacuum pressure