Oxidation furnace VF-3000

conveyorcabinetcontrolled atmosphere

This low-priced vertical furnace equipped with an auto conveyor can be used for a range of functions from R&D to mass production of 4- to 8-inch wafers. We have achieved such a low price that back end users can introduce this furnace. Ultra-high-temperature treatment is available and best suited for power device manufacturing. Features Low-cost equipment for back end users Mini batch, 50 to 75 wafers processing is available for R&D to mass-production line 4- to 8-inch wafer size is available Max 4 cassette stocks Excellent temperature control from low to medium high temperature range using an LGO heater High-speed wafer transfer using a single wafer handling robot Equipped with limited-function simple control system This furnace can be used for a wide range of wafer sizes from 4-inch to 8-inch, and processing in 50–75 wafers of mini batches can be chosen. With the hardware and control system content carefully selected to achieve a low price, this vertical furnace can be used for a wide range of functions from R&D to mass-production lines. Choose and use a suitable heater from an LGO heater, molybdenum disilicide (MoSi2) heater and carbon heater not only for low-temperature annealing, nitride (Si3N4), polysilicon (poly Si) and other material LPCVD, oxidation and diffusion but also for SiC power device gate silicon oxynitriding, activation annealing and other ultra-high-temperature treatment processes.