Magnetron sputtering PVD deposition machine
46 - 110 kVA | HELIOS, HELIOSpro
Leybold Optics
with economic manufacturing costs
The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Unsurpassed optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Ultimate precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements.
PARMS Process Technology
The deposition of metal oxides with high and low refractive indices with PARMS (Plasma Assisted Magnetron Sputtering) is achieved by combining dynamic reactive mid-frequency (MF), dual magnetron sputtering with partial pressure control, and a reactive assist process with the RF plasma source.
During each rotation, a thin sub-stoichiometric oxide layer is deposited by the selected dual magnetron and transferred to a non-absorbing oxide layer while passing the oxygen plasma of the RF source.
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