Silicon thin film thermal evaporation PVD deposition machine for photovoltaic applications
PHOEBUS
Leybold Optics
With a unique inline-cluster design the PHOEBUS concept is the only one that is especially adapted and engineered for Silicon thin-film applications. In such PHOEBUS customers achieve maximum levels on productivity and quality during daily production. This objective is achieved due to an exceptional design of the process chambers, which guarantees not only highest deposition rates within the PV market, but impressively uniform and reproducible layer characteristics in parallel.
Through automated and individual cleaning of every process chamber by means of greenhouse friendly gas Flour (F2) a maximum in productivity is achieved.
As each process chamber is connected to an evacuated transfer tunnel, the substrate is always kept under vacuum even during carrier-free transfer from one chamber to another. Additionally a newly developed heating system warrants that substrates are always kept at process temperature. Therefore drifts in temperature are excluded and process stability increased to its maximum.
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