video corpo

analog pyrometer / surface-mount / for MOCVD-process
UV 400 LumaSense Technologies



  • Display:


  • Configuration:


  • Applications:

    for MOCVD-process

  • Temperature:

    Max.: 1,300 °C (2,372 °F)

    Min.: 650 °C (1,202 °F)


The model LumaSense UV 400 and UVR 400 systems are the next generation of temperature sensors developed specifically for GaN-based MOCVD epitaxy processes. The UV 400 and UVR 400 now allow direct measurement of the wafer surface temperature instead of the traditional susceptor/pocket temperature. This improved measurement allows more accurate control of the wafer temperature leading to an improved yield.

These systems are now setting a new standard for LED production processes with results showing reliable correlation between process temperature and final product wavelength.

Measure temperature directly on the GaN layer using UV wavelength instrumentation
Provides a wide temperature range (650 … 1300 °C) to allow coverage of both main buffer growth and MQW growth
Minimize noise in measurement using true photon-counting instrumentation
Capture real time reflectance measurement using a fast pulsing light source
Includes 2 interface types: Analog output and RS485 with UPP protocol

Improve yield through accurate true wafer temperature measurement
Obtain reliable wafer temperature with PL wavelength correlation
Prevent residue temperature oscillation as seen in NIR emissivity-compensated pyrometers
Realize continuous real time reflectance measurement
Prevent data skew due to delayed sampling (no shutter on and off)
Provides a complete solution for reactor temperature control with PhotriX and concentric lightpipe options

Other LumaSense Technologies products

Infrared Thermometers and Switches