Light source for photolithography
MICRO-CONTROLE / Spectra-Physics
Oriel Instruments has long addressed the need for high resolution exposure sources for photolithography. This began with an advanced design mercury source with high intensity, collimation and uniformity unmatched in the industry. Building on that success, a line of mask alignment fixtures soon followed along with all of the building blocks of today's mask alignment systems. Today, Oriel offers an extensive family of tools to meet the everchanging needs of the broad photolithography market. We've continued to update our advanced designs and have added new products. Everything from flood exposure sources, to full mask alignment systems, to photoresist testing systems can be obtained from Oriel.
