air analyzer / elemental / for integration / NDIR
The Process Sense™ is suitable for determining the completion of the plasma chamber cleaning, in semiconductor and deposition chambers. The pressure analyzer minimizes the chamber erosion, due to overcleaning. As a result, the life service of the chamber is extended.
The device is designed from an infrared absorption, which is efficient for all plasma cleaning operations. It is offered in complete upgrade kits, for AMAT CVD tools.
It can be utilized in different applications involving silicon oxides, silicon nitrides, polysilicon and in silane or TEOS processes.