Distinctive Design Diamonex’s patented CMP conditioners are based on a unique process of bonding diamond grit to a substrate by depositing Chemical Vapor Deposition (CVD) diamond over the grit. This process results in an all-diamond surface that provides superior diamond retention by chemically bonding the diamond grit to the substrate. Unlike conventional conditioners, this all-diamond surface is also chemically inert to all CMP slurries, eliminating grit pullout due to corrosion or wear. In addition, the high-hardness diamond prevents mechanical erosion of bond matrix. PhoenixTM Product Innovation Diamonex is introducing the Phoenix product line of CMP conditioner. The Phoenix CMP conditioners are based on a patent-pending ceramic substrate design with optimally selected diamond grit. Extended Conditioner Life The Phoenix conditioner’s high working grit percentage results in longer conditioner life and more gradual pad cut rate decay. Consistent Conditioner Performance Diamonex utilities advanced quality control systems for raw material selections and process control to provide consistent conditioners, which result in excellent process repeatability. These features enable consistent material removal rate throughout the life of the conditioner and conditioner to conditioner. Corrosion Resistant Materials Because the Diamonex Phoenix CMP conditioner embodies pure diamond on a ceramic substrate, it provides optimum compatibility with the wafer fabrication process, virtually eliminating chemical interactions between slurry and conditioner.