lithography system
FX-103SH/103S Nikon Engineering

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lithography system lithography system - FX-103SH/103S
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Description

By incorporating techniques from both the FX-67S2, which is ideal for the production of small and medium-sized, high-definition panels, and the FX-86SH2, which excels in the production of TV panels, the FX-103SH/103S is optimized for manufacturing high-definition, large-sized panels and achieves a shorter takt time than our conventional Gen 10 lithography system.
The FX-103SH enables a high resolution of 2.2 pm.