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NORITAKE
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Induction heat treatment installation
NORITAKE

High performance, clean heat treatment system which meets semiconductor requirements for a high level of integration and increasing wafer size

High Temperature Annealing

High temperature annealing furnace with a normal operating temperature of 1,200°C (Max: 1350°C)
· A variety of high temperature annealing (Hydrogen, Argon, SIMOX, etc.)
· O-Ring seal provides a leak-free environment.
· Process tube with very precise pressure control
· Closed loop control through exhaust gas analysis
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