Large area semiconductor substrate mask aligner
Model 600 OAI

Description

The OAI Model 600 Large Substrate Mask Aligner System has many unique features that add to its exceptional versatility. It can be configured to suit the users unique needs, and is an excellent choice for ceramics, flat panels and Fodel™. This mask aligner has a wide range of options including special alignment optics, pressure sensitive chucks (for use with brittle substrates), and multi-spectral exposure systems, enabling the user to select the exposing wavelength (Near, Mid or Deep UV).

With its interchangeable subsystem modules, the system can be configured to meet standard applications as well as many unique or unusual requirements. Light Sources (using special, mirrored optics) are available up to 5KW for substrates up to 20 inches square.

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