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OAI
 

Nano-imprint photolithography system
Model 5000 OAI

The OAI Model 5000 is an advanced, high-performance mask aligner and exposure tool that delivers ultra precise, front side, sub-micron alignment and resolution for the most demanding semiconductor device and surface MEMS applications.

The system is available in manual or fully automated versions, and is capable of performing sub-micron, level-to-level alignment. It's flexible design allows printing on various substrates - round or square - up to 200mm. The exposure system is compatible with photoresist in Near, Mid or Deep UV range.
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standListOtherProduct www di En 2012-02-07-14