Wafer mask aligner
Model 200 OAI

Description

The OAI Model 200 Mask Aligner is a savvy superior cover aligner that has been designed with industry demonstrated segments that have made OAI a pioneer in the photolithography capital gear industry. The Model 200 is a seat top veil aligner that requires insignificant clean room space. It offers a financial option for R&d, or constrained scale, pilot creation.

Using an inventive, air bearing/vacuum toss leveling framework, the substrate is leveled rapidly and delicately, for parallel photograph cover arrangement and uniform contact over the wafer amid contact introduction. The framework is fit for one micron determination and arrangement accuracy.

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