The small-spot electron source EKF 1000 provides a compact and cost-effective solution for a wide range of SAM and SEM applications as well as static AES. It offers a highly stabilised beam current, and an achievable spot size < 2 µm at 5 keV with > 5 nA beam current. The source is equipped with a LaB6 filament enabling a high maximum beam current >10 µA. Quadrupole x/y-deflectors are employed for static and dynamic beam deflection in SAM and SEM imaging. The NGE 52 control unit covers the energy range from 100 eV to 5 keV and delivers a highly stabilised emission-regulated filament supply for reliable quantitative Auger analysis. The separate scan control unit (SCU) supports both internal TV rate and PC controlled scanning.
