Gas analysis system
APA 302
Pfeiffer Vacuum
- Process control in real time
- Easier queue time management
- Yield improvement
Applications
- Wafer and Mask environment → cleaning strategy
- Equipment & process → storage optimization
- Fab → cross contamination risk
Advantages
- Easy to use interface
- Automatic sampling
- Small foot print
- Without opening the Pod
Airborne Molecular Contaminiation (AMC):
AMC is known to decrease the yield and quality in IC fabrication <130 nm
Acids: Interconnect corrosion, haze effect, crystal growth
NH3, amines: Resin "T-topping", Critical Dimension modification (CD), haze effect,
Solvents: Gate oxide issues, etch rate decrease, epitaxy issues
Control System
The simple interface is designed for the cleanroom operators. It features:
- Pod identification entry by bar code/tags.
- Recording of cycle monitoring
- Warning for high value
- Graphical interface
- Ethernet networking capability
- Data saving and on-line analysis.
- Ambient AMC monitoring
A full automatic version is coming soon
* adixen patent pending
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